LR

LRCX

NasdaqGS

Lam Research Corporation

Technology
Semiconductor Equipment & Materials
United States
240.80USD
+3.30 (+1.39%)
Market Cap: 297.21B USD

Revenue and Net Income

Values in USD

Income Statement

Values in USD

Financial itemTTMJun 30, 2026Jun 30, 2026Jun 30, 2025Jun 30, 2024Jun 30, 2023
Total Revenue
23.23B23.23B18.44B14.91B17.43B
Cost of Revenue
11.51B11.51B9.46B7.85B9.65B
Gross Profit
11.73B11.73B8.98B7.05B7.78B
Operating Expense
3.53B3.53B3.08B2.77B2.56B
Operating Income
8.20B8.20B5.90B4.28B5.22B
Net Non Operating Interest Income Expense
39.30M39.30M53.13M66.70M-47.48M
Other Income Expense
23.37M23.37M4.03M11.42M-60.32M
Pretax Income
8.26B8.26B5.96B4.36B5.11B
Tax Provision
997.08M997.08M599.91M532.45M598.28M
Net Income Common Stockholders
7.27B7.27B5.36B3.83B4.51B
Diluted NI Available to Com Stockholders
7.27B7.27B5.36B3.83B4.51B
Basic EPS
5.795.794.172.913.33
Diluted EPS
5.765.764.152.903.32
Basic Average Shares
1.26B1.26B1.29B1.31B1.35B
Diluted Average Shares
1.26B1.26B1.29B1.32B1.36B
Total Operating Income as Reported
8.20B8.20B5.90B4.26B5.17B
Total Expenses
15.03B15.03B12.53B10.62B12.21B
Net Income from Continuing & Discontinued Operation
7.27B7.27B5.36B3.83B4.51B
Normalized Income
7.29B7.29B5.38B3.85B4.55B
Interest Income
196.19M196.19M231.33M251.94M138.98M
Interest Expense
156.88M156.88M178.20M185.24M186.46M
Net Interest Income
39.30M39.30M53.13M66.70M-47.48M
EBIT
8.42B8.42B6.14B4.55B5.30B
EBITDA
8.86B8.86B6.52B4.91B5.64B
Reconciled Cost of Revenue
11.51B11.51B9.46B7.85B9.65B
Reconciled Depreciation
441.53M441.53M386.28M359.70M342.43M
Net Income from Continuing Operation Net Minority Interest
7.27B7.27B5.36B3.83B4.51B
Total Unusual Items Excluding Goodwill
-30.08M-30.08M-26.41M-23.02M-49.23M
Total Unusual Items
-30.08M-30.08M-26.41M-23.02M-49.23M
Normalized EBITDA
8.89B8.89B6.55B4.93B5.69B
Tax Rate for Calcs
0.120.120.100.120.12
Tax Effect of Unusual Items
-3.64M-3.64M-2.67M-2.81M-5.76M

Key Statistics

Valuation

Market Cap (USD)297.21B
Market Cap (Local)297.21B
P/E (TTM)40.91
P/S (TTM)12.79
MC/EBITDA33.54

Volume & Shares

Last Volume11.64M
Avg Vol (10D)13.55M
Avg Vol (30D)9.29M
Avg Vol (90D)9.68M
Shares Outstanding1.25B

Growth Indicators

Revenue TTM/Ann1.00
Net Income TTM/Ann1.00
EBITDA TTM/Ann1.00
Gross Profit TTM/Ann1.00
Operating Inc TTM/Ann1.00

Currency & Exchange

Trading CurrencyUSD
Financial CurrencyUSD
Trading/USD Rate1.00
Financial/USD Rate1.00
ExchangeNasdaqGS

Lam Research Corporation designs, manufactures, markets, refurbishes, and services semiconductor processing equipment used in the fabrication of integrated circuits in the United States, China, Korea, Taiwan, Japan, Southeast Asia, and Europe. The company offers ALTUS systems to deposit conformal or selective films for tungsten or molybdenum metallization applications SABRE electrochemical deposition products for copper interconnect transition, which support copper damascene manufacturing Striker single-wafer atomic layer deposition products for dielectric film solutions and VECTOR plasma-enhanced chemical vapor deposition (CVD) products. It also provides Akara, a conductor etch system designed to enhance etch precision, selectivity, and defect control Argos, Prevos, and Selis, which are selective etch systems used in the fabrication of advanced logic and memory devices that require precise control at nanoscale dimensions Flex for dielectric etch applications Vantex, a dielectric etch system that provides RF technology and repeatable wafer-to-wafer performance enabled by Equipment Intelligence solutions Kiyo for conductor etch applications Syndion for deep silicon etch and Versys metal products for metal etch processes. In addition, the company offers Coronus bevel clean products to enhance die yield and Da Vinci, DV-Prime, EOS, and SP series products to address various wafer cleaning applications. Further, it provides Reliant deposition, etch, and clean products Sense.i platform products and customer service, spares, and upgrades. Lam Research Corporation was incorporated in 1980 and is headquartered in Fremont, California.